6.7nm euv - SERP Analysis

https://www.sciencedirect.com/science/article/pii/S0042207X24000708

https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8322/832214/A-67-nm-beyond-EUV-source-as-a-future-lithography/10.1117/12.916351.full

http://ui.adsabs.harvard.edu/abs/2012SPIE.8322E..14O/abstract

https://www.euvlitho.com/2011/P5.pdf

https://pubs.aip.org/apl/article/341315/Extreme-ultraviolet-source-at-6-7-nm-based-on-a

https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithography

https://www.eenewseurope.com/en/intel-fellow-discusses-high-na-euv-lithography-progress/

https://www.sciencedirect.com/science/article/abs/pii/S0042207X24006535

https://www.euvlitho.com/2013/S19.pdf

https://pubs.aip.org/aip/apl/article/99/19/191502/341315/Extreme-ultraviolet-source-at-6-7-nm-based-on-a

https://www.laserfocusworld.com/blogs/article/14039015/how-does-the-laser-technology-in-euv-lithography-work

https://www.researchgate.net/publication/257401654_Laser-plasma_extreme_ultraviolet_source_at_67_nm_using_a_rotating_cryogenic_Xe_target

https://www.spiedigitallibrary.org/conference-proceedings-of-spie/9776/97761M/Study-of-Gd-Tb-LPP-emission-near-%CE%BB--67nm/10.1117/12.2219840.short

https://www.quora.com/Why-cant-we-use-even-shorter-wavelengths-than-EUV-like-6-7-nm-for-making-advanced-semiconductor-chips

https://www.rit.edu/kgcoe/microsystems/lithography/research/euv/LWEUVL.pdf

https://www.eetimes.com/industry-mulls-6-7-nm-wavelength-euv/

https://www.cmu.edu/nanotechnology-forum/Forum_11/Presentation/PosterSession/4-10_Jung_Sik_Kim.pdf

https://wulixb.iphy.ac.cn/en/article/id/65905

https://www.researchgate.net/publication/233933152_A_67-nm_beyond_EUV_source_as_a_future_lithography_source

https://onlinelibrary.wiley.com/doi/full/10.1002/smo.20240043

https://research.utwente.nl/en/publications/multilayer-optics-for-67-nm-wavelength

https://spie.org/news/3765-shorter-wavelength-extreme-uv-sources-below-10nm

https://research.utwente.nl/en/publications/reflective-multilayer-optics-for-67-nm-wavelength-radiation-sourc

https://www.quora.com/What-is-the-next-step-after-extreme-ultraviolet-lithography-EUV-litho

https://ouci.dntb.gov.ua/en/works/lRnRqjEl/

http://onlinelibrary.wiley.com/doi/10.1002/ecj.11690/pdf

https://semiwiki.com/forum/threads/high-na-might-be-last-gen-litho.16753/

https://ouci.dntb.gov.ua/en/works/4YqbzMa4/

https://mountainscholar.org/bitstreams/6f3d5861-f739-47bc-827d-74f206b52c23/download

https://pmc.ncbi.nlm.nih.gov/articles/PMC8620789/

https://euvlsymposium.lbl.gov/pdf/2012/pres/V.%20Banine.pdf

https://waseda.elsevierpure.com/en/publications/prediction-of-resist-sensitivity-for-135-nm-euv-and-6x-nm-euv-ext

https://optics.org/news/7/5/39

https://www.nature.com/articles/srep09235

https://researchrepository.ucd.ie/rest/bitstreams/8378/retrieve

https://nanohub.org/resources/34003/download/2020.02.28-ECE595AL-L06.pdf

https://spie.org/samples/PM351.pdf

https://papers.ssrn.com/sol3/Delivery.cfm/d69a6a3e-0726-4087-8f0f-ada2b7306fdf-MECA.pdf?abstractid=4715851&mirid=1

https://dp.la/item/a672d1e1859c19009f9b3652924cd565

https://www.techbriefs.com/component/content/article/11574-10964-207

https://people.eecs.berkeley.edu/~attwood/sxr2009/lecnotes/07_EUV_Lithography_2009.pdf

https://www.kristal.ai/post/the-lithography-inflection-point---how-two-different-approaches-to-euv-could-reshape-the-semiconductor-industry

https://indico.classe.cornell.edu/event/2018/contributions/1822/contribution.pdf

https://rigaku.com/products/components/optics/euv/technology

https://www.universitywafer.com/euv.html?srsltid=AfmBOoqqzbW7GfdYILSv3fugxgYQkj8omwVL3QebZ6XsiXpqbCu5IdFV

https://journals.iucr.org/paper?yi5149

https://wulixb.iphy.ac.cn/en/article/doi/10.7498/aps.71.20211450

https://www.energetiq.com/hubfs/Adv_Litho_Poster_Reisman.pdf?hsLang=en

https://ui.adsabs.harvard.edu/abs/2024SPIE13177E..11H/abstract

https://m.researching.cn/articles/OJ1ddc404b9a80a3a3/referenceandcitations

https://www.ivysci.com/articles/3082400__The_effect_of_target_material_concentration_on_EUV_near_67nm_and_outofband_radiation_of_laserproduce

https://iopscience.iop.org/article/10.1088/1361-6463/ab4317

https://chemrxiv.org/engage/chemrxiv/article-details/6849bf343ba0887c339ccec5

https://www.preprints.org/manuscript/202110.0083/v1/download

https://www.komatsu.jp/en/company/tech-innovation/report/pdf/166-E04.pdf

https://ucd.academia.edu/TCummins

https://researchrepository.ucd.ie/entities/publication/be735392-2ec7-47ee-951f-ca0b5296ea1d

https://opg.optica.org/oe/abstract.cfm?uri=oe-21-26-31837

https://www.osti.gov/servlets/purl/757358

https://www.axt.com.au/products/xuus/brochure/?doc_id=1354

https://www.szyunze.com/how-far-can-asml-euv-lithography-technology-go/

https://www.researchdisclosure.com/database/RD727029

https://vixra.org/pdf/2007.0167v2.pdf

https://accelconf.web.cern.ch/FEL2014/papers/fra04.pdf

https://www.nsrrc.org.tw/NsrrcWebSystem/UPLOADS/CHINESE/PUBLISH_YEARLY/2012/P51-52.pdf

http://www.globalauthorid.com/WebPortal/ArticleView?wd=4C5A8D0827CA78F7A27B168B0C60DA98888DF91013E9EB64222ACAD96A918B66

https://www.iof.fraunhofer.de/en/business-fields/functional-optical-surfaces-and-layers/new-lithography-generation.html

https://link.aps.org/accepted/10.1103/PhysRevApplied.6.034009

https://www.nature.com/articles/nphoton.2011.266.pdf

https://www.semanticscholar.org/paper/A-6.7-nm-beyond-EUV-source-as-a-future-lithography-Otsuka-Li/339902f6eac4fe805851866f568606a7dced7dd1

https://lasp.colorado.edu/media/projects/SORCE/documents/SSI_Workshop_2012/2b_Hill_SSIVar_Hilbl.pdf

https://arxiv.org/pdf/1411.4505

https://jp.foundation.canon/common/pdf/aid_awardees/2/k2_8_higashiguchi_security.pdf

https://nanomelbourne.com/newsletter/nanofabulous-seminar-adventures-in-lithography-with-x-ray-and-extreme-ultraviolet-radiation/

https://semiengineering.com/manufacturing-bits-oct-5/

https://www.jstage.jst.go.jp/article/ieejfms/133/10/133_526/_article

https://colab.ws/articles/10.1116%2F1.4813789

https://www.freepatentsonline.com/y2020/0124978.html

https://www.komatsu.jp/en/-/media/home/aboutus/innovation/technology/techreport/2016/en/170331_06.pdf

https://inspirehep.net/files/b358c9c9392f1cf038ff9bb5e94f3901

https://pure.tue.nl/ws/files/3872978/banine2014.pdf

https://opg.optica.org/abstract.cfm?uri=ol-49-13-3604

https://semiwiki.com/forum/threads/intel-expects-high-na-stitching.20277/

https://www.researchdisclosure.com/database/RD726018

https://journals.iucr.org/s/issues/2024/03/00/yi5149/yi5149.pdf

https://scienceon.kisti.re.kr/srch/selectPORSrchArticle.do?cn=NART128819175

https://pmc.ncbi.nlm.nih.gov/articles/PMC11075725/

https://papers.ssrn.com/sol3/papers.cfm?abstract_id=4715851

https://www.nikonprecision.com/ereview/spring_2011/article04.html

https://goldberg.lbl.gov/papers/Anderson_SPIE_8322_(2012).pdf

https://hero.epa.gov/hero/index.cfm/reference/details/reference_id/4279305

https://m.researching.cn/articles/OJ212bb75b0a59b95b/referenceandcitations

https://www.jasri.jp/iuss/content/files/workshop/2022/device10/watanabe_device10.pdf

https://www.scribd.com/document/466453343/LWEUVL-pdf

https://iopscience.iop.org/article/10.1088/1742-6596/583/1/012007/pdf

https://arxiv.org/pdf/2006.13418

https://digital.library.unt.edu/ark:/67531/metadc735143/

https://link.springer.com/content/pdf/10.3103/S0027134911020111.pdf

https://events01.synchrotron.org.au/event/158/contributions/4919/contribution.pdf